Argonne researchers have invented a novel method of depositing fluoride thin films.
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US Patent 11111578B1
- Atomic layer deposition of fluoride thin films (ANL-IN-19-039)
Alkaline earth metal fluorides have various optical applications due to their fascinating property of exhibiting high transparency, ranging from wavelengths in vacuum ultraviolet to the long infrared spectrum. Argonne’s novel method for depositing fluoride thin films uses very low temperatures and results in epitaxial growth.