Abstract: Molecular-scale phenomena at heterogeneous interfaces (solid-liquid and solid-gas) are central to processes ranging from materials synthesis to electrochemical charge storage and catalysis. Surface sensitive synchrotron X-ray techniques offer powerful characterization tools to explore such processes under realistic conditions and gain fundamental insights that can drive future technological advances.

In this talk, I will present two projects that exemplify the high surface sensitivity of X-ray reflectivity. First, I will discuss our recent development of a hard x-ray compatible in situ chemical vapor deposition chamber built to characterize the synthesis of silicon carbide, a promising material for quantum sensing and communications applications. Second, I will describe the application of resonant anomalous X-ray reflectivity to probe the structure of adsorbed ions at charged surfaces with elemental specificity.