Mark Muir is a postdoctoral appointee at Argonne National Laboratory in the Materials Science Division, Emerging Materials Group. He also collaborates with the Chemistry Division, Solar Energy Conversion Group. His work is focused on engineering new mixed oxide materials using atomic layer deposition (ALD) and sequential infiltration synthesis (SIS) to enhance electric and optical properties. 

Mark’s background is in ultra-high vacuum (UHV) surface science with applications in heterogenous catalysis and astrochemistry. He applies his background at Argonne by studying these oxide material’s surface defects at the atomic level and their corresponding electronic band structures using scanning tunneling microscopy/spectroscopy (STM/S) under UHV. These insights helps to guide development of new materials and control site-selective ALD growth. 

Education

• Ph.D., Chemistry, University of Illinois at Chicago, 2021
• M.S., Chemistry, University of Illinois at Chicago, 2019
• B.S., Mathematics, St. Xavier University, 2016
• B.S., Chemistry, St. Xavier University, 2015