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  • This is the first demonstration of an autonomous” frequency source that can maintain a constant frequency and vibrating amplitude when no external power is provided, making it ideal for applications requiring an oscillator in low power, or limited and in
    Intellectual Property Available to License

    US Patent 9,680,414 B1
    • Frequency and Amplitude Stabilization in MEMS and NEMS Oscillators (IN-15-101)

    This invention comprises a nonlinear micro- and nano-mechanical resonator that can maintain frequency of operation and amplitude of operation for a period of time after all external power has been removed from the device. Utilizing specific nonlinear dynamics of the micromechanical resonator, mechanical energy at low frequencies can be input and stored in higher frequencies modes, thus using the multiple degrees of freedom of the resonator to extend its energy storage capacity. Furthermore, the energy stored in multiple vibrational modes can be used to maintain the resonator oscillating for a fixed period of time, even without an external power supply.

     

  • Argonne licensing opportunity
    Intellectual Property Available to License
    US Patent 9,966,966 B2
    • Nonlinearity Induced Synchronization Enhancement in Mechanical Oscillators (IN-15-079)

    An autonomous oscillator synchronizes to an external harmonic force only when the forcing frequency lies within a certain interval, known as the synchronization range, around the oscillator’s natural frequency. Under ordinary conditions, the width of the synchronization range decreases when the oscillation amplitude grows, which constrains synchronized motion of micro- and nano-mechanical resonators to narrow frequency and amplitude bounds.

    The present invention shows that nonlinearity in the oscillator can be exploited to manifest a regime where the synchronization range increases with an increasing oscillation amplitude. It also shows that nonlinearities in specific configurations of oscillator systems, as described herein, are the key determinants of the effect. This invention presents a new configuration and operation regime that enhances the synchronization of micro- and nano-mechanical oscillators by capitalizing on their intrinsic nonlinear dynamics.

  • A method and an apparatus
    Intellectual Property Available to License

    US Patent 9,412,480 B2
    • Diffraction Leveraged Modulation of X-Ray Pulses Using MEMS-Based X-Ray Optics (IN-12-047)

    A method and apparatus are provided for implementing Bragg-diffraction leveraged modulation of X-ray pulses using MicroElectroMechanical systems (MEMS) based diffractive optics. An oscillating crystalline MEMS device generates a controllable time-window for diffraction of the incident X-ray radiation. The Bragg-diffraction leveraged modulation of X-ray pulses includes isolating a particular pulse, spatially separating individual pulses, and spreading a single pulse from an X-ray pulse-train.

  • Argonne licensing opportunity
    Intellectual Property Available to License
    US Patent 8,906,772 B2; US Patent 9,202,684 B2; US Patent 9,875,894 B2
    • Graphene Layer Formation

    A system and method for forming graphene layers on a substrate. The system and methods include direct growth of graphene on diamond and low temperature growth of graphene using a solid carbon source.

    Technologies:

    GRAPHENE LAYER FORMATION AT LOW SUBSTRATE TEMPERATURE ON A METAL AND CARBON BASED SUBSTRATE (IN-11-055) View patent details.

    GRAPHENE LAYER FORMATION ON A CARBON BASED SUBSTRATE (IN-11-055B) View patent details.

    GRAPHINE LAYER FORMATION AT LOW SUBSTRATE TEMPERATURE ON A METAL AND CARBON BASED SUBSTRATE (IN-11-055C) View patent details.

  • Argonne licensing opportunity
    Intellectual Property Available to License
    US Patent 8,963,659 and US Patent 8,525,185 B2
    • RF MEMS Capacitive Switches with High Reliability

    The present invention provides for an electrostatic microelectromechanical (MEMS) device comprising a dielectric layer separating a first conductor and a second conductor. The first conductor is moveable towards the second conductor, when a voltage is applied to the MEMS device. The dielectric layer recovers from dielectric charging failure almost immediately upon removal of the voltage from the MEMS device.

    Technology: RF MEMS Capacitive Switches with High Reliability (IN-09-053) View patent details.

    A reliable long life RF-MEMS capacitive switch is provided with a dielectric layer comprising a fast discharge diamond dielectric layer” and enabling rapid switch recovery, dielectric layer charging and discharging that is efficient and effective to enable RF-MEMS switch operation to greater than or equal to 100 billion cycles.

    Technology: RF-MEMS capacitive switches with high reliability View patent details.

  • A nanopositioning system for producing a coupling interaction between a first nanoparticle and a second nanoparticle.
    Intellectual Property Available to License

    US Patent 9,548,677B2; US Patent 8,922,094B2
    • Microelectromechanical (MEMS) Manipulators for Control of Nanoparticle Coupling Interactions

    A first MEMS positioning assembly includes an electro-static comb drive actuator configured to selectively displace a first nanoparticle in a first dimension and an electrode configured to selectively displace the first nanoparticle in a second dimensions. Accordingly, the first nanoparticle may be selectively positioned in two dimensions to modulate the distance between the first nanoparticle and a second nanoparticle that may be coupled to a second MEMS positioning assembly. Modulating the distance between the first and second nanoparticles obtains a coupling interaction between the nanoparticles that alters at least one material property of the nanoparticles applicable to a variety of sensing and control applications.

    Technologies: MICROELECTROMECHANICAL (MEMS) MANIPULATORS FOR CONTROL OF NANOPARTICLE COUPLING INTERACTIONS (IN-09-050) View patent details.

    MICROELECTROMECHANICAL (MEMS) MANIPULATORS FOR CONTROL OF NANOPARTICLE COUPLING INTERACTIONS (IN-09-050B) View patent details.

  • Unique bellows design provides added flexibility at a low cost to users requiring UHV conditions
    Intellectual Property Available to License
    US Patent Application 16/286,193
    • Torsionally Flexible Attachment System and Method (ANL-IN-18-027)

    Technology available for licensing: Modern manufacturing, research, and development systems often depend on ultra-high vacuum (UHV) conditions for precise, repeatable environmental control. The components that provide this condition are engineered from stainless steel or other robust, vacuum-compatible materials, but users frequently require linear and rotational degrees of freedom for alignment and manipulation of components being processed or evaluated inside of the UHV system. Standard bellows” that provide coupling between fixed components do not allow for rotational flexibility, and users are often required to add expensive, custom in-vacuum motion systems to meet their processing needs.

    Argonne’s unique bellows design provides added flexibility at a low cost to users requiring UHV conditions. The Argonne solution allows for rotational alignment between system components to reduce or eliminate the need for mechanical manipulation provided by expensive, customized components. The invention can benefit clean” production environments, including semiconductor manufacturing, synchrotrons or other research systems, precision optics, or other general vacuum or pressurized systems.

    Benefits

    • Compatibility with standard UHV components
    • Replaces expensive in-vacuum motion systems
    • Provides design and alignment flexibility
    • Maintains vacuum integrity

    Applications and Industries

    • Semiconductor manufacturing
    • Synchrotron & Free-Electron Laser (FEL) light source facilities
    • Research systems
    • Optical systems
    • Vacuum systems requiring rotational alignment or manipulation
    • Liquid and gas handling systems
  • A porous substrate is coated with Chinese ink followed by atomic layer deposition
    Intellectual Property Available to License
    Systems and methods for photothermal material
    • ANL-IN-18-039 entitled SYSTEMS AND METHODS FOR PHOTOTHERMAL MATERIAL

    The invention comprises a method to fabricate photothermal materials. A porous substrate, such as a membrane or sponge, is coated with Chinese ink followed by atomic layer deposition. More

    Abstract

    Chinese ink is applied on various materials and stabilized by atomic layer deposition to fabricate solar steam generation devices. The encapsulated ink has excellent photothermal properties and evaporation efficiency under simulated sunlight, holding great promise in solar evaporation device applications.

  • Exhibits a tightly bound hydration layer upon exposure to water
    Intellectual Property Available to License
    U.S. Patent Application 15/994,825
    • Systems and Methods for Oleophobic Composite Membranes (ANL-IN-17-184)

    Atomic layer deposition is utilized to deposit a coating on a membrane. The coated membrane exhibits a tightly bound hydration layer upon exposure to water. The resultant coated membrane is oleophobic. More

  • A membrane exhibiting sides with different properties
    Intellectual Property Available to License
    US Patent Pending 15/977,831
    • Janus Membranes via Atomic Layer Deposition (ANL-IN-17-134)

    A membrane exhibiting sides with different properties (“Janus membrane”) and methods of fabricating such a membrane. The membrane comprises a polymer material lacking polar functional groups. One side of the membrane is masked during atomic layer deposition (ALD). ALD is utilized to deposit a conformal coating on an exposed side of the membrane. More