May 3-14, 2021, APS/CNM Joint Virtual Users Meeting
ALL EVENTS HELD VIRTUALLY
The annual joint users meeting of the Center for Nanoscale Materials (CNM) and the co-located Advanced Photon Source (APS) was held virtually in 2021 by Argonne National Laboratory. Anyone was welcome to register for myriad activities including technical workshops that highlight, promote, and stimulate user science; plenary sessions; poster sessions; a vendor expo; and CNM short courses.
CNM USERS EXECUTIVE COMMITTEE (UEC) ELECTION RESULTS:
Sophie Canton (XFEL, Germany), Karen Mulfort (CSE Argonne), Kamal Soni (Corning, Inc.)
CNM BEST STUDENT POSTER PRIZE: Ariel Leonard, Northwestern University "Photophysical Implications of Ring Fusion, Linker Length, and Twisting Angle in a Series of Perylenediimide-Thienoacene Dimers"
Joint APS/CNM Plenary Session
Monday morning, May 10
- DOE UPDATE: Linda Horton, Associate Director of Science for DOE Basic Energy Sciences
- CNM FACILITY STATUS UPDATE: Ilke Arslan, Director, Center for Nanoscale Materials
CNM Plenary Session
Monday afternoon, May 10
Moderator: Jean-Luc Ayitou - Vice-Chair, CNM Users Executive Committee
- CNM KEYNOTE: 1:30 pm Stephen Forrest, University of Michigan
Professor of Electrical Engineering & Computer Science, Physics and Materials Science & Engineering
"Organic Heterojunctions: A Platform for Understanding and Controlling the Optical and Electronic Properties of Disordered Materials" - 2:15 pm Alex Martinson, Argonne National Laboratory
Materials Science Division
"Towards Precision Inorganic Clusters: Sequential Infiltration Synthesis, Atomic Structure and Conductivity" - 3:00 pm Break
- 3:20 pm CNM Users Executive Committee
Update from the CNM Users Executive Committee
User Town Hall (Topics: Input on Future Capabilities; Writing a Successful CNM User Proposal) - 4:30 pm Adjourn
CNM Workshops
Collaborative Opportunities for Industry to Partner with CNM
- Monday, May 3, all day
- Co-organizers: Anirudha Sumant (CNM)
Hybrid Quantum Systems
- Thursday, May 13 and Friday, May 14
- Co-organizers: Xu Han (CNM), Dafei Jin (CNM), and Xufeng Zhang (CNM)
Joint APS/CNM Workshops
Interpreting Hierarchical Data at Nanocenters and X-ray User Facilities
- Tuesday, May 4, all day
- Co-organizers: Yue Cao (APS), Maria K. Chan (CNM), Mathew Cherukara (APS), Wendy Di (MCS)
Applications of AI/ML to Real-time Multi-modal Analysis for Light Sources and Electron Microscopy
- Wednesday, May 5 and Thursday, May 6, mornings
- Co-organizers: Mathew Cherukara (APS), Subramanian Sankaranarayanan (CNM), Chengjun Sun (APS), and Nicholas Schwarz (APS)
Dynamics in Soft Matter with Emphasis on Complex Fluids (XPCS)
- Tuesday, May 11 and Wednesday, May 12, mornings
- Co-organizers: Xiao-Min Lin (CNM), Suresh Narayanan (APS), and Qingteng Zhang (APS)
Joint APS/CNM Poster Session
Tuesday afternoon, May 11
CNM Short Courses
Overview of Thin Film Deposition Methods at CNM
- Wednesday, May 5, afternoon
- Instructor: Liliana Stan (CNM)
- This course introduces fundamental concepts and operating principles for the deposition of thin films by physical vapor deposition or chemical methods, providing a broad overview of thin film deposition methods, their advantages, and limitations. Understanding all methods, with their specific limitations and compromises with respect to process specifics and substrate materials, helps in determining the methods that are suitable for achieving the expected film properties. Deposition methods that are available at the Center for Nanoscale Materials include sputtering, evaporation, atomic layer deposition (ALD), and chemical vapor deposition (CVD), and these will be discussed in detail.